Nikon said on Oct. 26 that it has begun accepting orders for the FX-6ASLH, a G6 flat-panel-display lithography system for high-definition OLED and LCD production. Its stated 0.85-µm line-and-space resolution requires a phase-shift mask and chemically amplified resist. Nikon lists a UV-LED illumination system, real-time focus correction and overlay accuracy of ±0.18 µm or better; the sales launch is scheduled for December 2027.
GLOBAL IMAGING BRIEF
Analysis: A finer exposure capability could help panel makers evaluate denser display patterns, while throughput, overlay and process yield must be assessed together under the stated mask, resist and substrate conditions. Nikon's order announcement is not evidence that customers have installed or qualified the machine.
Original source
Original source: Nikon's Oct. 26 announcement. Performance figures and the December 2027 sales timing are company-reported and subject to their stated test conditions.